English
nXQ55i 200-240V Multi Stage Roots Dry Pump
HVC-A78052310
The nXQ55i is designed for environments where gas containment is essential, providing a remarkably low leak rate < 5×10⁻⁸ mbar·l/s.
Its Multistage Roots design provides an dry, dust-free environment, enabling clean operation for sensitive applications.
The nXQ55i is optimised to support gas retention and minimise contamination, which is particularly useful in helium recirculation systems.
With a focus on reliability and system integrity, it provides a robust solution for advanced applications such as:
- Helium-4 cryostats
- Dilution refrigeration systems
- Leak detection setups
- Pump Model
- nXQ55i
- Voltage & Phases
- 200-240 VAC, 50/60HZ 1-Ø
- Pumping Speed
- 55 m³/h
- Final Pressure
- 3 · 10-2 mbar
The nXQ55i is designed for environments where gas containment is essential, providing a remarkably low leak rate < 5×10⁻⁸ mbar·l/s.
Its Multistage Roots design provides an dry, dust-free environment, enabling clean operation for sensitive applications.
The nXQ55i is optimised to support gas retention and minimise contamination, which is particularly useful in helium recirculation systems.
With a focus on reliability and system integrity, it provides a robust solution for advanced applications such as:
- Helium-4 cryostats
- Dilution refrigeration systems
- Leak detection setups